Device for aligning masks in photolithography

ABSTRACT

The present invention provides a device for aligning masks in photolithography, wherein in a first mask holder for a first mask at least one adapter for a second mask can be provided, so that masks being adapted to either the first mask holder or to the at least one adapter can be used in the device. The invention is advantageous in that it allows an easy, time and cost saving changeover from one mask size to at least one different mask size.

[0001] The invention relates to a device for aligning masks in photolithography. The device according to the present invention is suitable for a quick changeover to different mask sizes during an automatic loading of masks.

[0002] In photolithography masks are used for structuring substrate (wafer) surfaces during the exposure of a photosensitive resist to light. Such a mask is disclosed, e.g., in DE-A1-198 10 055. In the industrial production of, e.g., electric components it is often necessary to use different wafer sizes. Changing the wafer size also requires a change of the mask size. Up to now it is common practice to use for a different mask size also a different mask holder and, correspondingly, to use also different mask magazines for the different masks. Replacing the mask holders and the magazines is time-consuming and leads to increased costs.

[0003] It is the object of the present invention to provide an economical device for aligning masks in photolithography which allows a simple and quick changeover from one mask size to at least one different mask size.

[0004] This object is achieved with the features of the claims.

[0005] In achieving this object, the invention starts out from the following basic ideas.

[0006] A first mask holder, which is intended for a specific mask size, contains at least one exchangeable adapter which is preferably concentrically arranged in the first mask holder's opening or aperture through which light can pass. Without an adapter a larger mask can be held, and by inserting an adapter a smaller mask size can be used. The second mask is arranged on an area whose dimensions correspond to those of the area of the first mask. Thus, the same frame and the same guide as for the first mask can also be used for the second mask.

[0007] The invention can advantageously be used during an automatic mask loading with the same mask magazines after a simple adaptation of a present device for aligning masks. By means of the invention, the changeover of a mask size to at least one different mask size can be carried out easily in a time and cost saving manner.

[0008] In the following, the invention is explained in more detail on the basis of the drawings in which

[0009]FIG. 1 shows a schematic view of an embodiment of the present invention;

[0010]FIG. 2 shows an adapter for the embodiment of the present invention according to FIG. 1;

[0011]FIG. 3 shows a mask for the embodiment of the present invention according to FIG. 1;

[0012]FIG. 4 shows the embodiment of the present invention according to FIG. 1 without adapter; and

[0013]FIG. 5 is a real picture showing a perspective view of the schematic views of FIGS. 1 to 3.

[0014]FIG. 1 is a schematic view of the embodiment of a device 1 according to the present invention for aligning masks in photolithography. As mask holder 2 a is arranged in a frame 4. The opening 6 of the mask holder 2 a comprises an exchangeable adapter 2 b which also allows the use of a smaller mask than that suitable for the mask holder 2 a. For a comparison, it is referred to FIG. 4 in which the mask holder 2 a, which is intended for a large mask 3 a, is used without an adapter. In FIG. 1 a correspondingly smaller mask 3 b is provided for the adapter 2 b. The mask 3 b is arranged on an area having the same lateral dimensions (square with the side length a) as the mask 3 a. This means that in the same device 1 with the same frame 4 and the same guide rails 5 at least one further mask 3 b can be used. The device 1 can in the same manner also be adapted to two or more masks by arranging preferably concentrically further adapters in the mask holder 2 a. This means that these further mask would, as the second mask 3 b, be arranged on a square area having the side length a and could thus be introduced into the guide rails 5.

[0015]FIGS. 2 and 3 show isolated views of the adapter 2 b and the mask 3 b. The mask 3 b has preferably a side length b of 229 mm (9 inch) and allows the use of a smaller wafer in the device 1 whose mask holder 2 a is preferably intended for a mask having a side length a of 356 mm (14 inch).

[0016] The use of the device 1 for the 14-inch mask is shown in FIG. 4, in which the adapter 2 b is removed so that the mask 3 a can be used.

[0017] The device 1 is suitable for an automatic loading of masks from one and the same magazine. Since the different masks are each arranged on an area having the same side lengths, they can be stacked in the same magazine and are loaded into the device 1 in the same manner. The masks are guided in the guide rails 5 in the direction of the arrow A in FIGS. 1 and 4 over the corresponding mask holder 2 a or the adapter 2 b and aligned with a wafer (not shown) arranged below the device 1. After the corresponding masks have been removed in the same manner, new masks having either the same size or, after insertion of a corresponding adapter, having a smaller size can be used.

[0018]FIG. 5 is a real picture showing a perspective view of the schematic view of FIGS. 1 to 3. It can be taken from FIG. 5a that the opening 6 of the mask holder 2 a has recesses 7 into which corresponding projections 8 of the adapter 2 b fit in order to align the adapter 2 b with the mask holder 2 a. FIG. 5b shows a second mask 3 b having a side length b on an area having the side length a, which corresponds to the area of the 14-inch mask 3 a. The mask 3 b can be exchangeably held by pins at the positions 9 in the square area having the side length a. FIG. 5c shows the mask 3 b on the adapter 2 b, wherein the structures of the adapter show through the mask 3 b.

[0019] The invention is preferably intended for quickly replacing 14-inch masks with 9-inch masks during an automated production process. 

1. A device for aligning masks in photolithography, wherein at least one adapter (2 b) for a second mask (3 b) can be arranged in a first mask holder (2 a), in order to form with the first mask holder (2 a) at least one second mask holder, so that first or second masks (3 a or 3 b, respectively) being either adapted to the first mask holder (2 a) or to the adapter (2 b) can be used in the device.
 2. The device according to claim 1, wherein the adapter (2 b) is-concentrically arranged in an opening (6) of the first mask holder (2 a).
 3. The device according to claim 1 or 2, wherein the first mask (3 a) has a square area having a side length of 356 mm, and the second mask (3 b) has a square area having a side length of 229 mm.
 4. The device according to any one of claims 1 to 3 comprising a frame (4) on which the first mask holder (2 a) is arranged, wherein the frame (4) has a guide (5) in which either the first mask (3 a) or the second mask (3 b) can be moved, for aligning it with the substrate, over the first mask holder (2 a) or the adapter (2 b), and wherein the second mask (3 b) is arranged on an area having the side lengths of the first mask (3 a).
 5. The device according to any one of claims 1 to 4, wherein the first and second masks (3 a and 3 b) can be supplied from the same mask magazine.
 6. The device according to any one of claims 1 to 5, wherein in the first mask holder (2 a) two adapters for two masks can be arranged so that the device (1) can be used for three masks. 